Characterization of LiMn2O4 thin films grown on Si substrates by pulsed laser deposition

LiMn2O4 thin films were deposited on Si substrates at 575 °C and 100 mTorr of oxygen by pulsed laser deposition. The film was flat and dense with an average size of crystals of about 260 nm and showed mainly (1 1 1) out-of plane preferred texture. The initial specific capacity was about 111 mAh/g with a current density of 50 μAh/cm2. Ex situ XRD and Raman were used to investigate the structure changes of LiMn2O4 thin film after intercalation and deintercalation of lithium. XRD results revealed a relatively smaller lattice change with the removal of lithium in this thin film, compared to that of powder LiMn2O4 cathode.