Electroless preparation of macroporous Cu thin film from large-scale-orderly colloid monolayer

A facile method to fabricate the highly ordered colloid monolayer of a large scale is demonstrated. The colloidal template involves the ordered array of ∼ 100 nm silica colloids functioned with 3-mercaptopropyltrimethoxysilane (MPTMS) by spin coating on the silicon wafer etched square pattern with an ∼ 100 nm depth. Based on the new nanostructure, highly ordered macroporous Cu thin film can be prepared from Pd nanoparticles-based electroless deposition. By the deposition time, the macroporous thin film of various thicknesses can be prepared. Additionally, the Cu film with (111) strong texture is deposited on the gold substrate of single crystalline (111) orientation.