Structure and washing fastness of composite fluorocarbon/ZnO films prepared by RF sputtering

Composite fluorocarbon/ZnO films were deposited by RF sputtering, using polytetrafluoroethylene and Zn targets, on polyethylene terephthalate substrates. Argon and oxygen were used as working and reacting gases, respectively, with an oxygen:argon volume ratio of 3:1. The films were characterized by X-ray Photoelectron Spectroscopy, Fourier Transform Infrared Spectroscopy and static contact angle measurements. It was found that the deposited films are made up of the four components –CF3, –CF2–, –CF– and –C–. The proportions of the four components varied with sputtering conditions. There was a large number of C=C double bonds on the surface of deposited films. The static contact angle of the deposited films was greater than 90°, indicating excellent hydrophobicity. The contact angle of films decreased after washing, and the washing fastness of the composite films were slightly inferior to those of the fluorocarbon films.