کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1660986 1517694 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units
چکیده انگلیسی

Uniformity of plasma density and 4s excited Ar (Ar⁎) density profiles in a 500-mm cylindrical plasma source sustained with eight LIA units have been investigated with a fluid-simulation code. Uniformity of the simulated radial profiles of plasma density on the substrate holder located at a distance of 300 mm from a top flange became better with increasing Ar pressure from 1.3 Pa to 6.7 Pa. The radial uniformity of plasma density in the central 300 mm region was evaluated to be approximately 4.0% at 6.7 Pa. Uniformity of the radial profiles of Ar⁎ density became better with increasing distance of the substrate holder to the down-stream region. In the present antenna configuration, fairly uniform radial profiles of Ar⁎ density can be obtained at a distance of 300 mm from the top flange.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 202, Issues 22–23, 30 August 2008, Pages 5238–5241
نویسندگان
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