کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660986 | 1517694 | 2008 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units](/preview/png/1660986.png)
Uniformity of plasma density and 4s excited Ar (Ar⁎) density profiles in a 500-mm cylindrical plasma source sustained with eight LIA units have been investigated with a fluid-simulation code. Uniformity of the simulated radial profiles of plasma density on the substrate holder located at a distance of 300 mm from a top flange became better with increasing Ar pressure from 1.3 Pa to 6.7 Pa. The radial uniformity of plasma density in the central 300 mm region was evaluated to be approximately 4.0% at 6.7 Pa. Uniformity of the radial profiles of Ar⁎ density became better with increasing distance of the substrate holder to the down-stream region. In the present antenna configuration, fairly uniform radial profiles of Ar⁎ density can be obtained at a distance of 300 mm from the top flange.
Journal: Surface and Coatings Technology - Volume 202, Issues 22–23, 30 August 2008, Pages 5238–5241