Chemical composition and bond structure of carbon-nitride films deposited by CH4/N2 dielectric barrier discharge

Carbon nitride films have been deposited by dielectric barrier discharge with a CH4/N2 gas mixture at different conditions. Fourier Transform Infrared (FTIR) spectroscopy, X-ray photo electron spectroscopy (XPS), Raman spectroscopy, Atomic force microscopy (AFM) and ellipsometry were used to systematically study chemical composition, bond structure and surface morphology of deposited films. Various bonds between carbon, nitrogen, hydrogen, and also oxygen were observed.