کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1661839 | 1008432 | 2007 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Pulsed laser deposition of anatase and rutile TiO2 thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The investigation deals with the preparation of both anatase and rutile thin films from a sintered rutile target of TiO2 by pulsed laser ablation technique. Microstructural characterization of the sintered target was carried out using X-ray diffraction and AC impedance spectroscopy. Thin films of titania were deposited on (111) Si substrates at 673 K in the laser energy range 200-600 mJ/pulse at two different conditions: (i) deposition at 3.5 Ã 10â 5 mbar of oxygen, and (ii) deposition at an oxygen partial pressure of 0.1 mbar. The influence of laser energy and oxygen addition on the film growth has been studied. X-ray diffraction analysis of the films indicated that the films are single phasic and nano crystalline. Titania films deposited in the energy range 200-600 mJ/pulse at a base pressure of 5 Ã 10â 5 mbar are rutile with particle sizes in the range 5-10 nm, whereas the films formed at the oxygen partial pressure 0.1 mbar are anatase with particle sizes in the range 10-24 nm. In addition, at higher energies, a significant amount of particulates of titania are found on the surface of the films. The change in the microstructural features of the films as a function of laser energy and oxygen addition is discussed in relation with the interaction of the ablated species with the background gas.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issue 18, 25 June 2007, Pages 7713-7719
Journal: Surface and Coatings Technology - Volume 201, Issue 18, 25 June 2007, Pages 7713-7719
نویسندگان
S. Murugesan, P. Kuppusami, N. Parvathavarthini, E. Mohandas,