کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1662287 | 1517696 | 2007 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Thin BCxNy films were grown by plasma enhanced chemical vapour deposition using N-trimethylborazine and nitrogen mixture. The thermodynamic analysis of the chemical vapour deposition in the B–C–N–H–O system was carried out for temperatures from 300 to 1300 K, a total pressure from 1.33 to 1333 Pa, residual pressure of 0.40 Pa and a wide range of N2:B3N3H3(CH3)3 ratio. The effect of the substrate temperature and rf power on the chemical composition and optical properties of the deposits was studied by ellipsometry, scanning electron and atomic force microscopy, FTIR-spectroscopy, and optical transmittance spectrophotometry.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issues 22–23, 25 September 2007, Pages 9009–9014
Journal: Surface and Coatings Technology - Volume 201, Issues 22–23, 25 September 2007, Pages 9009–9014
نویسندگان
V.S. Sulyaeva, Yu.M. Rumyantsev, M.L. Kosinova, A.N. Golubenko, N.I. Fainer, F.A. Kuznetsov,