کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1790661 1524440 2014 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
On the solution of solute diffusion during eutectic growth
ترجمه فارسی عنوان
در محلول انتشار محلول در طی رشد یوتکتیک
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
چکیده انگلیسی


• The eutectic composition is necessarily found at the triple-junction in the solution of the stoichiometric-compound/stoichiometric-compound eutectic.
• A general solution is proposed for any kind of eutectics and phase diagrams.
• The current work makes it possible to incorporate the kinetics of triple-junction into the eutectic growth model.

An exact solution of solute diffusion for the stoichiometric-compound/stoichiometric-compound eutectic is derived for a planar interface. Compared with the previous work, the solution is consistent with the kinetics of triple-junction, i.e. the eutectic composition is necessarily found at the triple-junction. Adopting an averaged conservation law at the interface, a general solution is proposed for any kind of eutectics and phase diagrams. Simulation results in the Ni5Si2–Ni3Si eutectic growth show that the general solution is a good approximation. The current work makes it possible to incorporate the kinetics of triple-junction into the eutectic growth model.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 389, 1 March 2014, Pages 68–73
نویسندگان
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