Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition

We report formation and optical properties of site-controlled, multi-stack InGaAs/GaAs quantum dots (QDs) embedded in GaAs nanowires (NWs) by selective metalorganic chemical vapor deposition. InGaAs/GaAs QDs are realized in GaAs NWs grown on patterned GaAs(111)B substrates in the form of InGaAs/GaAs heterostructures and identified by structural analyses and photoluminescence characterization. Optical characterization at 10 K corroborates formation of high-quality, multi-stack InGaAs/GaAs QD-in-NWs up to 50-stack without degradation of PL intensities. In addition, light emission at room temperature from multi-stack InGaAs/GaAs QDs embedded in GaAs NWs is realized. These results would enable the realization of high-performance IBSCs based on site-controlled QD-in-NWs utilizing existing, well-established NW growth technologies on a GaAs platform.

► Multi-stack, site-controlled InGaAs/GaAs QDs are demonstrated in GaAs NWs by selective MOCVD.
► High-quality multi-stack QDs are realized without degradation of PL intensities up to 50-stack.
► Existence of QD array in NWs is elucidated by scanning transmission electron microscopy.