Growth and optical characterisation of multilayers of InGaN quantum dots

We report on the growth (using metal-organic vapour phase epitaxy) and optical characterisation of single and multiple layers of InGaN quantum dots (QDs), which were formed by annealing InGaN epilayers at the growth temperature in nitrogen. The size and density of the nanostructures have been found to be fairly similar for uncapped single and three layer QD samples if the GaN barriers between the dot layers are grown at the same temperature as the InGaN epilayer. The distribution of nanostructure heights of the final QD layer of three is wider and is centred around a larger size if the GaN barriers are grown at two temperatures (first a thin layer at the dot growth temperature, then a thicker layer at a higher temperature). Micro-photoluminescence studies at 4.2 K of capped samples have confirmed the QD nature of the capped nanostructures by the observation of sharp emission peaks with full width at half maximum limited by the resolution of the spectrometer. We have also observed much more QD emission per unit area in a sample with three QD layers, than in a sample with a single QD layer, as expected.

► Growth and optical characterisation of single and multiple layers of InGaN quantum dots.
► Effect of the number of InGaN QD layers on metallic nanostructure height and density.
► Effect of the GaN barrier growth temperature on metallic nanostructure height and density.
► Observation of much more QD emission per unit area in a 3 QD layer sample.