کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1792521 1023648 2010 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Model based, pulling rate, thermal and capillary conditions setting for silicon tube growth
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Model based, pulling rate, thermal and capillary conditions setting for silicon tube growth
چکیده انگلیسی
In this paper a mathematical model based procedure for setting of pulling rate, capillary and thermal conditions to grow a silicon tube with prior established inner and outer radius by shaped growth with the catching boundary condition is presented. The model is defined by a set of three differential equations governing the evolution of outer radius, inner radius and the crystallization front level. The right hand members of the system of differential equations serve as tools for setting the above parameters. Numerical illustration and simulation of the growth process are presented.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 312, Issue 23, 15 November 2010, Pages 3549-3554
نویسندگان
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