کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1795787 1023729 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Three-dimensional unsteady modeling analysis of silicon transport in melt during Cz growth of Ge1−xSix bulk crystals
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Three-dimensional unsteady modeling analysis of silicon transport in melt during Cz growth of Ge1−xSix bulk crystals
چکیده انگلیسی

Si transport in the melt during Czochralski (Cz) growth of Ge1−xSix bulk crystals has been simulated within a 3D unsteady approach using two models of Si sources. The effect of the rod number on Si supply to the crystallization front is discussed. The crystallization front geometry is computed taking into account crystallization temperature varying with Si concentration. The predicted geometry is compared with experimental data. To study the effect of 3D unsteady melt motion, the results are compared with 2D axisymmetric computations of Si transport.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 303, Issue 1, 1 May 2007, Pages 141–145
نویسندگان
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