کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1797290 1023775 2006 10 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor
چکیده انگلیسی

A detailed computational study is carried out to investigate the effects of Grashof (Gr) and Reynolds (Re) numbers on the three-dimensional (3-D) flow structures and heat transfer characteristics in a horizontal chemical vapor deposition (CVD) reactor with a circular heated disk which simulates a 12-inch wafer. The Grashof number is varied from 8.13×104 to 813 and the Reynolds number is from 100 to 25. For the range of parameters studied, both the transverse (return flow) and longitudinal rolls are observed to appear in 3-D. Computed flow structures and heat flux distributions suggest that for constant Grashof number condition the size and location of longitudinal rolls have direct impact on the homogeneity of deposition, while the size and location of transverse rolls have a minor effect on the heat flux and hence on the deposition rate. In addition, the effect of Reynolds number on the averaged heat flux is negligible under a fixed Grashof number condition. The buoyancy-to-inertia ratio is found to play an effective role in retarding the formation of transverse and longitudinal rolls.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 293, Issue 2, 1 August 2006, Pages 475–484
نویسندگان
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