کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1810465 | 1025563 | 2012 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films](/preview/png/1810465.png)
چکیده انگلیسی
Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈0 2 0〉 fiber texture along the loading direction and a strong 〈0 0 2〉 fiber texture perpendicular to the loading direction. For the 650 °C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physica B: Condensed Matter - Volume 407, Issue 17, 1 September 2012, Pages 3437–3440
Journal: Physica B: Condensed Matter - Volume 407, Issue 17, 1 September 2012, Pages 3437–3440
نویسندگان
H. Wang, G.A. Sun, B. Chen, Y.Q. Fu, X.L. Wang, X.T. Zu, H.H. Shen, Y.P. Liu, L.B. Li, G.Q. Pan, L.S. Sheng, Q. Tian,