MgB2 thin films by hybrid physical–chemical vapor deposition

Hybrid physical–chemical vapor deposition (HPCVD) has been the most effective technique for depositing MgB2 thin films. It generates high magnesium vapor pressures and provides a clean environment for the growth of high purity MgB2 films. The epitaxial pure MgB2 films grown by HPCVD show higher-than-bulk Tc due to tensile strain in the films. The HPCVD films are the cleanest MgB2 materials reported, allowing basic research, such as on magnetoresistance, that reveals the two-band nature of MgB2. The carbon-alloyed HPCVD films demonstrate record-high Hc2 values promising for high magnetic field applications. The HPCVD films and multilayers have enabled the fabrication of high quality MgB2 Josephson junctions.