کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1886442 | 1043524 | 2012 | 7 صفحه PDF | دانلود رایگان |
E-beam evaporated CdTe thin films were processed with N+ ion bombardment as in situ process. The N+ ion glow was generated using simple Multipurpose Al probe instead of conventional plasma sources. The prepared films were identified as nano crystalline using XRD analysis. High N+ ion fluence helped to grow (3 1 1) oriented CdTe thin films instead of (2 2 0) and (1 1 1). The observed results revealed the effect of N+ ion fluence on the structural parameters like lattice parameter, d space value, crystalline size, dislocation density, micro strain etc. The observed optical band gap values lie in between 1.47 and 1.77 eV. The effect of N+ ion bombardment on optical properties was also reported. Noticeable change in electrical and surface properties was also observed. The observed value shows the reproducibility as <1% and it is suggested that the N+ ion plasma was effectively utilized to modify the structural, optical and surface properties as in situ.
► Ion bombardment with N+ ion as in situ using low cost multipurpose Al probe for both for ion cleaning and ion irradiation.
► High N+ ion fluence helps to grow (3 1 1) oriented CdTe thin films instead of (2 2 0) and (1 1 1).
► Observed optical band gap values vary between 1.47 and 1.77 eV.
► Considerable changes on structural, optical and surface properties were achieved.
Journal: Radiation Physics and Chemistry - Volume 81, Issue 2, February 2012, Pages 201–207