کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
190601 | 459702 | 2011 | 9 صفحه PDF | دانلود رایگان |

Nickel-based alloys 182, 600 and 52 were exposed to simulated Pressurized Water Reactor (PWR) primary water (1000 ppm B, 2 ppm Li, O2 <10 ppb, 325 °C) under different dissolved hydrogen (DH) conditions [0, 2, 25 and 50 cm3 H2(STP) kg−1] for times up to 1 month in a recirculating autoclave. The influence of exposure time and DH on oxide films formed on the alloys was evaluated by means of electrochemical tests; electrochemical impedance spectroscopy (EIS) and Mott–Schottky (M–S). The in situ EIS was performed every day, allowing the monitoring of the oxide layer formation and change. M–S was performed at room temperature after the full exposure time. The results showed that the maximum in the defect concentrations obtained via M–S analysis and the maximum crack growth rate are at the same DH content, thus relating electrochemical testing to stress corrosion cracking observations. A conceptual separation between the electrochemical behavior of (1) the oxide layer (visible in the higher frequencies of EIS) and (2) the oxide layer – solution interface (visible in the lower frequencies of EIS) was able to explain the effect of hydrogen on the low-frequency EIS impedance results.
Journal: Electrochimica Acta - Volume 56, Issue 23, 30 September 2011, Pages 7871–7879