کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
191244 459716 2010 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Galvanic displacement of BixTey thin films from sacrificial iron group thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Galvanic displacement of BixTey thin films from sacrificial iron group thin films
چکیده انگلیسی

BixTey thin films synthesized by galvanic displacement were systematically investigated by observing open circuit potential (OCP), surface morphology, microstructure and film composition. Surface morphologies and crystal structures of synthesized BixTey thin films were strongly depended on the type of the sacrificial materials (i.e., nickel (Ni), cobalt (Co) and iron (Fe)). Galvanically deposited BixTey thin films from the sacrificial Ni and Co thin films exhibited Bi2Te3 intermetallic compounds and hierarchical structures with backbones and sub-branches. A linear relationship of deposited Bi content in BixTey thin films as a function of [Bi3+]/[HTeO2+] ratio (within a range of less than 0.8) in the electrolyte was also observed. Surface morphologies of BixTey thin films were altered with the film composition.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 55, Issue 3, 1 January 2010, Pages 1072–1080
نویسندگان
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