Behavior of alumina barrier layer in the supporting electrolytes for deposition of nanowired materials

In this study, we report the results obtained investigating the behavior of sulfuric and chromic acid alumina templates in typical supporting electrolytes frequently used for alternating current (ac) deposition of various nm-scaled materials. Qualitative analysis of voltammetric profiles taken for as-grown, ac-treated and annealed alumina films in a conventional tetraborate re-anodizing solution revealed dramatical changes in the properties of alumina barrier layer during ac treatment in these supporting electrolytes even at low current density. These changes were related here with the transport of protons through the barrier layer during ac treatment, discharge at the metal/oxide interface and hydrogenation of alumina material by hydrogen atoms in an upward way. This conclusion comes from the behavior of Pt/Hg|alumina|Mez+ electrode and the valence band X-ray photoelectron spectra taken from the inner part of alumina barrier layer material before and after the ac treatment.