کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
192555 459745 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Self-aligned nanogaps and nanochannels via conventional photolithography and pattern-size reduction technique
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Self-aligned nanogaps and nanochannels via conventional photolithography and pattern-size reduction technique
چکیده انگلیسی

A simple method for the fabrication of self-aligned nanogaps and fluidic nanochannels by using conventional photolithography combined with patterned-size reduction technique is presented. The method is based on the complete conversion of a photolithographically microstructured metal layer – exhibiting a high expansion coefficient – to a metal oxide with an improved pattern size resolution using thermal oxidation. With this technique, there are no principal limitations to fabricate nanostructures with different layouts down to several nanometer dimensions. In this work, the proposed method is experimentally demonstrated by preparing self-aligned nanogaps and nanochannels on a Si–SiO2 substrate down to 15–20 nm dimensions.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 54, Issue 25, 30 October 2009, Pages 6010–6014
نویسندگان
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