کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
193793 459777 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of nanogaps by nanoscale Cu electrodeposition and dissolution
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Formation of nanogaps by nanoscale Cu electrodeposition and dissolution
چکیده انگلیسی

We utilize an ac feedback signal to control the size of Cu nanogaps by electrochemically depositing or dissolving copper onto pre-patterned electrodes. The ac frequency in this work was set to 820 Hz, at which the capacitive reactance contributes notably to the gap impedance. As a result, distinct changes can be observed in the monitored signals at relatively large gap size, as compared with the high sensitivity of resistive reactance to small gap distance when the frequency is set lower. Within the present parameter, we have prepared nanoscale gaps ranging from tens of nm to sub-10 nm by carefully choosing the subsequent deposition or dissolution time.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 52, Issue 12, 10 March 2007, Pages 4210–4214
نویسندگان
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