کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
194608 459796 2008 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Electrochemical investigation of the influence of thin SiOx films deposited on gold on charge transfer characteristics
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Electrochemical investigation of the influence of thin SiOx films deposited on gold on charge transfer characteristics
چکیده انگلیسی

The paper reports on the investigation of the electrochemical behavior of a thin gold film electrode coated with silicon dioxide (SiOx) layers of increasing thickness. Stable thin films of amorphous silica (SiOx) were deposited on glass slides coated with a 5 nm adhesion layer of titanium and 50 nm of gold, using plasma-enhanced chemical vapor deposition (PECVD) technique. Scanning electrochemical microscopy (SECM) and electrochemical impedance spectroscopy (EIS) were used to investigate the electrochemical behavior of the interfaces. In the case of SECM, the influence of the SiOx thicknesses on the electron transfer kinetics of three redox mediators was investigated. Normalized current–distance curves (approach curves) were fitted to the theoretical model in order to find the effective heterogeneous first order rate constant (keff) at the sample. EIS was in addition used to confirm the diffusion barrier character of the SiOx interlayer.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 53, Issue 27, 15 November 2008, Pages 7908–7914
نویسندگان
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