کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
194630 459796 2008 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Capacitance effect on Co-layer dissolution during pulse potentiostatic deposition of Co–Cu/Cu multilayers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Capacitance effect on Co-layer dissolution during pulse potentiostatic deposition of Co–Cu/Cu multilayers
چکیده انگلیسی

Electrodepositon of Co–Cu/Cu multilayer was carried out employing two-pulse potentiostatic method from a sulphate based single solution electrolyte. Dissolution characteristics of thin Co-layer preceding a Cu-layer, were investigated using chronoamperometry, chronocolumetry and electrochemical quartz crystal microbalance (EQCM) techniques. Both galvanic displacement due to Cu2+ ions and cell capacitance effect were found to be responsible for the dissolution of Co-layer during pulse switchover from Co to Cu-discharge. Competitive effect of these two factors on Co-dissolution was found to depend solely on the choice of discharge potential pair of Cu and Co. Co-layer dissolution could be prevented on application of Cu-discharge potential very close to the point of onset of Co-reduction potential. An effort has been made to understand the thickness loss due to capacitance effect by adopting a double layer model. It was also seen that the Cu-layer formed due to galvanic displacement reaction was porous in nature, and allows the Co-layer underneath to corrode for several nanometers upon allowance.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 53, Issue 27, 15 November 2008, Pages 8070–8077
نویسندگان
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