کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
197147 | 459872 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
MOCVD of hard metallurgical coatings: Examples in the Cr–C–N system
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
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چکیده انگلیسی
All individual phases of the ternary Cr–C–N system including stable and metastable ones can be deposited at low temperature by metalorganic chemical vapor deposition (MOCVD). These growth processes are mainly based on the use of bis(benzene)chromium as chromium source and various co-reactives. Then, from a good control of the reactive gas phase, it is possible to combine these MOCVD processes to grow in the same reactor protective coatings designed with a complex architecture based on polyphased, nanostructured or multilayer structure which exhibit enhanced properties. These deposition processes are described and the main features of the coatings are discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 50, Issue 23, 25 August 2005, Pages 4525–4530
Journal: Electrochimica Acta - Volume 50, Issue 23, 25 August 2005, Pages 4525–4530
نویسندگان
F. Maury,