کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
219644 | 463287 | 2011 | 10 صفحه PDF | دانلود رایگان |

We have demonstrated for the first time that silver can be electrochemically etched to form porous structures ranging from the nano- to the microscale. Silver wires, foils and films deposited on a silicon wafer were etched in both acidic (HF) and basic (NH3) N,N-dimethylformamide (DMF) solutions. We describe a possible etching mechanism for pore formation in which the convection within the etching solution focuses the etching current, while the organic solvent component stabilizes the nascent pore walls. Finally, the fabricated porous silver was shown to act as an effective substrate for surface-enhanced Raman scattering (SERS).
Graphical abstactPorous silver structures were prepared by electrochemical etching and the structures were explored as a SERS substrate.Figure optionsDownload as PowerPoint slideHighlights
► We demonstrate that silver can be electrochemically etched in both acidic (HF) and basic (NH3) N,N-dimethylformamide (DMF) solutions.
► Porous silver with nanoscale and microscale features was produced.
► We describe a possible etching mechanism for pore formation.
► The fabricated porous silver was shown to act as an effective substrate for surface-enhanced Raman scattering (SERS).
Journal: Journal of Electroanalytical Chemistry - Volume 659, Issue 2, 15 August 2011, Pages 151–160