Release behavior of tritium in pure copper and its alloys into pure water at ambient temperature

Release behaviors of tritium (T) from pure copper (Cu) and its alloys into pure water were examined at ambient temperature by a tritium imaging plate technique and a liquid scintillation counting technique. Two mechanisms govern the liberation of T into pure water; one is rapid release and the other is chronic release. The former is caused by diffusional release of T dissolved in bulk of Cu alloys and the latter by release of T strongly bound on/in surface oxide layers.