Towards fabrication of 3D isotopically modulated vertical silicon nanowires in selective areas by nanosphere lithography

Towards fabrication of 3D isotopically modulated vertical silicon nanowires in selective areas by nanosphere lithography

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 179, 5 July 2017, Pages 74-82

Gerry Hamdana, Tobias Südkamp, Marion Descoins, Dominique Mangelinck, Lorenzo Caccamo, Maik Bertke, Hutomo Suryo Wasisto, Hartmut Bracht, Erwin Peiner,