Sub-50-nm structure patterning by combining nanoimprint lithography and anisotropic wet etching without considering original mold resolution

Sub-50-nm structure patterning by combining nanoimprint lithography and anisotropic wet etching without considering original mold resolution

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 169, 5 February 2017, Pages 39-42

Hiroyuki Kuwae, Akiko Okada, Shuichi Shoji, Jun Mizuno,