کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5005876 | 1461377 | 2017 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Liquid-phase deposition of thin Si and Ge films based on ballistic hot electron incidence
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
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چکیده انگلیسی
Using the reducing activity of ballistic hot electrons emitted from a nanocrystalline silicon (nc-Si) diode, it is demonstrated that thin Si and Ge films can be deposited under a situation that output electrons directly impinge upon a SiCl4 or GeCl4 solution-coated target substrate located in close proximity to the nc-Si emitter. After the electron incidence, uniform deposition of thin Si or Ge films was clearly observed in the irradiated area. In accordance with spectroscopic characterizations, no signs of contaminations were detected in deposited thin Si and Ge films, and those films exhibit features as oxidized nano-clusters. It is also shown that from a thermodynamic viewpoint, the output electron energy of the nc-Si emitter is suitable for promoting preferential reduction of target ions within the penetration depth in solutions followed by the nuclei formation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 70, 1 November 2017, Pages 44-49
Journal: Materials Science in Semiconductor Processing - Volume 70, 1 November 2017, Pages 44-49
نویسندگان
Ryutaro Suda, Mamiko Yagi, Akira Kojima, Nobuya Mori, Jun-ichi Shirakashi, Nobuyoshi Koshida,