کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5006180 1461385 2017 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of F6V2 complexes in F-implanted Ge determined by x-ray absorption near edge structure spectroscopy
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Formation of F6V2 complexes in F-implanted Ge determined by x-ray absorption near edge structure spectroscopy
چکیده انگلیسی
The local structure of fluorine incorporated in crystalline germanium by ion implantation and annealing has been investigated by x-ray absorption near edge structure (XANES) spectroscopy. The XANES spectra of different FmVn complexes have been simulated by ab initio calculations and compared with the experimental spectrum. In our study, we show that most of the F in Ge forms F6V2 complexes, lengthening the Ge-Ge distances in the close proximity.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 62, May 2017, Pages 205-208
نویسندگان
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