کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5010186 | 1462196 | 2017 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Abnormal behavior with hump characteristics in current stressed a-InGaZnO thin film transistors
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Abnormal behavior with hump characteristics in current stressed a-InGaZnO thin film transistors Abnormal behavior with hump characteristics in current stressed a-InGaZnO thin film transistors](/preview/png/5010186.png)
چکیده انگلیسی
We investigated the degradation mechanism of a-InGaZnO TFTs under simultaneous gate and drain bias stress. Gate and drain bias of 20Â V were applied simultaneously to induce current stress, and abnormal turn-around behavior in transfer characteristics with a hump phenomenon were identified. Hump characteristics were interpreted in terms of parasitic current path, and the degradation itself was found to be caused dominantly by the electrical field and to be accelerated with current by Joule heating. The mechanism of asymmetrical degradation after current stress was also investigated. By decomposing the curves into two curves and measuring the relaxation behavior of the stressed TFTs, we also found that abnormal turn-around behavior in the transfer characteristics was related to acceptor-like states.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 137, November 2017, Pages 22-28
Journal: Solid-State Electronics - Volume 137, November 2017, Pages 22-28
نویسندگان
Woo-Sic Kim, Yong-Jung Cho, Yeol-Hyeong Lee, JeongKi Park, GeonTae Kim, Ohyun Kim,