Rapid reagent-less on-line H2O2 quantification in alkaline semiconductor etching solution

A rapid, reagent-less calorimetric method was developed for automatic on-line H2O2 quantification in industrial alkaline semiconductors etching solution. The method is based on the H2O2 catalytic decomposition by immobilized MnO2 generating heat proportional to its concentration and the employment of the Temperature-Time curve slope as a measure of the concentration.192