کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5185267 | 1381073 | 2008 | 4 صفحه PDF | دانلود رایگان |
This communication describes the formation of high index of refraction polymer thin films using a novel plasma polymerization deposition process. A flowing afterglow plasma reactor was modified to enable sublimation of solid samples into the gas phase for subsequent plasma polymerization. Thin films of plasma polymerized ferrocene were deposited on substrates and subsequently characterized. The refractive index as a function of processing conditions was obtained. Relatively high values of n (â¼1.73 at 589Â nm) were obtained. The chemical nature of the polymer thin films was characterized using FTIR and XPS spectroscopy. This work demonstrates that plasma polymerization is an enabling technology for the fabrication of photonic thin films that utilize solid state precursors.
Journal: Polymer - Volume 49, Issue 19, 9 September 2008, Pages 4042-4045