کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5207427 1382350 2008 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The influence of solvent residue, support type and UV-irradiation on surface morphology of poly(methyl methacrylate) films studied by Atomic Force Microscopy
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی آلی
پیش نمایش صفحه اول مقاله
The influence of solvent residue, support type and UV-irradiation on surface morphology of poly(methyl methacrylate) films studied by Atomic Force Microscopy
چکیده انگلیسی
Thin poly(methyl methacrylate) films have been obtained by casting polymer solution onto borosilicate glass and aluminum supports from organic solvents, such as chloroform, chlorobenzene, toluene, acetone and tetrahydrofuran. Atomic Force Microscopy has been chosen as a method for investigation of the influence of solvent residue and support type on the topography and roughness of the PMMA films before and after UV-irradiation of 254 nm wavelength. It was found that, besides information on sample morphology, AFM provides valuable details on polymer-support interactions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Polymer Testing - Volume 27, Issue 6, September 2008, Pages 736-742
نویسندگان
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