کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5367758 1388372 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Characterization of the low temperature dopant activation behavior at NiSi/silicon interface formed by implant into silicide method
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Characterization of the low temperature dopant activation behavior at NiSi/silicon interface formed by implant into silicide method
چکیده انگلیسی

Process temperature and thermal budget control are very important for high-k dielectric device manufacturing. This work focuses on the characteristics of low temperature activated nickel silicide/silicon (M/S) interface formed by implant into silicide (IIS) method. By combining SIMS, C-V, I-V, and AFM measurements in this work, it provides a clear picture that the high dopant activation ratio can be achieved at low temperature (below 600 °C) by IIS method. From SIMS and C-V measurements, high dopant activation behavior is exhibited, and from I-V measurement, the ohmic contact behavior at the M/S junction is showed. AFM inspection displays that under 2nd RTA 700 °C 30 s no agglomeration occurs. These results suggest that IIS method has the potential to integrate with high-k dielectric due to its low process temperature. It gives an alternate for future device integration.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 254, Issue 19, 30 July 2008, Pages 6151-6154
نویسندگان
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