Keywords: سیلیکید نیکل; Nickel silicide; Eutectic solidification; Lamellar structure; Laser annealing;
مقالات ISI سیلیکید نیکل (ترجمه نشده)
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Keywords: سیلیکید نیکل; Nano-patterning; Buried layer; Ion implantation; Solar cell; Nickel silicide;
Keywords: سیلیکید نیکل; Tungsten corrosion; Chemical mechanical polishing; Nickel silicide; Contact plugs; Electrochemical effect
Keywords: سیلیکید نیکل; TEM analysis; Nickel silicide; Solar cell metallization;
Nickel mono-silicide formation using a photo-thermal process assisted by ultra-violet laser
Keywords: سیلیکید نیکل; Laser processing; Ultra-violet laser; Photo-thermal processing; Nickel silicide; Diffusion;
Interface oxides in femtosecond laser structured plated Ni-Cu-Ag contacts for silicon solar cells
Keywords: سیلیکید نیکل; Silicon solar cell; Metallization; Laser ablation; Interface; Nickel silicide;
Effect of Interface Trap States on Optical Barrier Height of NiSi/Si Infrared Detector
Keywords: سیلیکید نیکل; Infrared sensor; Nickel silicide; Interface trap states; DLTS;
Formation of (CoxNi1−x)Si2 ternary silicide by thermal annealing of evaporated Co/Ni thin films on Si substrate
Keywords: سیلیکید نیکل; Ternary silicide; (CoxNi1−x)Si2; Nickel silicide; Cobalt silicide; Sheet resistance XRD; RBS; Raman; SEM
Overcoming electrical and mechanical challenges of continuous wave laser processing for Ni-Cu plated solar cells
Keywords: سیلیکید نیکل; Silicon; Solar cell; Ni-Cu plating; Selective emitter; Nickel silicide; Metal contact adhesion;
Analysis of solar cell cross sections with micro-light beam induced current (µLBIC)
Keywords: سیلیکید نیکل; µLBIC; Raman spectroscopy; Micro-characterization; Grain boundary diffusion; Nickel silicide
The calculation of the reflection coefficients by analyzing resistivity data of the Ni–Si silicide films formed at 850 °C by RTA
Keywords: سیلیکید نیکل; Thin films; Nickel silicide; Rapid thermal annealing; Electrical properties; Grain boundary scattering; Reflection coefficient
Solid phase growth of NiSi in polycrystalline Si on SiO2 with Cl plasma containing NiCl
Keywords: سیلیکید نیکل; Nickel silicide; Plasma; Solid phase growth;
Silicided Au/Ni bilayer on p-type [0 0 1] silicon for low contact resistance metallization schemes
Keywords: سیلیکید نیکل; Nickel silicide; Specific contact resistance; Backside metallization; Trans-rotational structures
Stress-induced voiding in nickel silicide
Keywords: سیلیکید نیکل; Stress-induced void; Nickel silicide; Strained active area; Rapid thermal annealing; XPS; Stress migration
Si tunneling transistors with high on-currents and slopes of 50 mV/dec using segregation doped NiSi2 tunnel junctions
Keywords: سیلیکید نیکل; Dopant-segregation; Tilted implantation; Nanowire TFET; Nickel silicide
Pt redistribution in N-MOS transistors during Ni salicide process
Keywords: سیلیکید نیکل; Nickel silicide; Atom probe tomography; Platinum redistribution; θ-Ni2Si; Silicide process
Direct observation of Ni decorated dislocation loops within As+-implanted silicon and arsenic clustering in Ni silicide contact
Keywords: سیلیکید نیکل; Implantation; Preamorphisation; Thin films; Nickel silicide; Dislocation; Diffusion; Cottrell atmospheres; Segregation; Atom probe tomography
Diffusion formation of nickel silicide contacts in SiNWs
Keywords: سیلیکید نیکل; Nanowire; Nickel silicide; Contacts; Kinetics; Activation energy
Effect of catalyst for nickel films for NiSi formation with improved interface roughness
Keywords: سیلیکید نیکل; ALD; Nickel silicide; Catalyst; Iodine; XRD; AES; Leakage current
Growth of amorphous silica nanowires using nickel silicide catalyst by a thermal annealing process
Keywords: سیلیکید نیکل; Silica nanowires; Nickel silicide; Rapid-thermal-annealing
Epitaxial growth of uniform NiSi2 layers with atomically flat silicide/Si interface by solid-phase reaction in Ni-P/Si(1Â 0Â 0) systems
Keywords: سیلیکید نیکل; Nickel silicide; Phosphorous; Interface;
Study of nickel silicide formation on Si(1Â 1Â 0) substrate
Keywords: سیلیکید نیکل; 73.30.+y, 68.60.Dv, 85.40.Ls; Nickel silicide; Si(1Â 1Â 0) substrate; Rapid thermal annealing; Schottky contacts;
Evidence for the interfacial reaction between Ni adatoms and H-Si(001) surface
Keywords: سیلیکید نیکل; Silicon; Nickel silicide; Interfacial reaction; X-ray photoelectron spectroscopy (XPS);
Oxygen distribution in nickel silicide films analyzed by time-of-flight secondary ion mass spectrometry
Keywords: سیلیکید نیکل; NiSi; Nickel silicide; LSI; Time-of-flight secondary ion mass spectrometry; TOF-SIMS; Oxygen distribution;
Effects of Laser in situ annealing on crystal quality of NiSi film grown on Si(001) substrate
Keywords: سیلیکید نیکل; 78.30.Hv; 81.07.-b; 81.40.EfNiSi; Nickel silicide; Laser annealing; Raman spectroscopy; Electron beam evaporation
Improved electrical and thermal properties of nickel silicides by using a NiCo interlayer
Keywords: سیلیکید نیکل; Nickel silicide; NiCo interlayer; Thermal stability
Characterisation of nickel silicide thin films by spectroscopy and microscopy techniques
Keywords: سیلیکید نیکل; 68.55.Nq; 82.80.âd; 68.55.Jk; 68.37.âd; 81.05.Je; Nickel silicide; Spectroscopy; Microscopy; Kikuchi patterns;
Nanostructuring in Ni/SiC reaction layers, investigated by imaging of atomic columns and DFT calculations
Keywords: سیلیکید نیکل; Thin films; Textured growth; Nickel silicide; Graphitic carbon; Silicon carbide; High resolution and analytical electron microscopy (HAADF-STEM; Z-contrast); Diffusion; Density functional theory
Characterization of the low temperature dopant activation behavior at NiSi/silicon interface formed by implant into silicide method
Keywords: سیلیکید نیکل; 61.72.Tt; 81.20.ân; Nickel silicide; Implant into silicide; Solid phase epitaxial regrowth; Rapid thermal anneal;
Self-aligned nickel-platinum silicide oxidation
Keywords: سیلیکید نیکل; Nickel silicide; Platinum; Selective etch; Oxidation; Corrosion;
Physical and electrical characterization of Ni–Si Phase transformation
Keywords: سیلیکید نیکل; Phase transformation; Electrical property; Silicidation; Nickel silicide
A Hafnium interlayer method to improve the thermal stability of NiSi film
Keywords: سیلیکید نیکل; Nickel silicide; Thermal stability; Agglomeration; Diffusion barrier; Phase change; Schottky diode
Energy-loss near-edge structure (ELNES) and first-principles calculation of electronic structure of nickel silicide systems
Keywords: سیلیکید نیکل; Nickel silicide; Electronic structure; ELNES; First-principles calculation
Oriented growth of silicide and carbon in SiC-based sandwich structures with nickel
Keywords: سیلیکید نیکل; Thin films; Textured growth; Nickel silicide; Graphitic carbon; Silicon carbide; High resolution and analytical electron microscopy
Oxidation of Ni(Pt)Si by molecular vs. atomic oxygen
Keywords: سیلیکید نیکل; XPS; Nickel silicide; Platinum; Oxidation; Atomic oxygen; Silicate;
Analysis of low temperature RTP needs for IC metallization
Keywords: سیلیکید نیکل; Rapid thermal processing (RTP); Isothermal cavity; Nickel silicide; Cobalt silicide; Repeatability
Interface alloying due to Kr-irradiation on Ni/Si system
Keywords: سیلیکید نیکل; 34.5.Dy; 61.80.−x; 68.37.Ps; 68.37.Rt; 68.37.Yz; 68.55.Ln; 73.61.At; 79.20.RfIon beam mixing; Nickel silicide; Rapid thermal annealing; SEM/EDAX; XRD; AFM/MFM
Silicide pre-clean effects on NiPtSi thermal stability for 65 nm technologies and beyond
Keywords: سیلیکید نیکل; Nickel silicide; Surface preparation; Thermal stability; Fluorine
Formation of Ni silicide at room temperature studied by laser atom probe tomography: Nucleation and lateral growth
Keywords: سیلیکید نیکل; Nickel silicide; Atom probe tomography
Ni–Pt silicide formation through Ti mediating layers
Keywords: سیلیکید نیکل; Nickel silicide; Titanium; Oxidation; Mediated reaction
Mechanism of lithium insertion into NiSi2 anode material for lithium ion batteries
Keywords: سیلیکید نیکل; anode; lithium ion batteries; nickel silicide; high capacity;
Strain relaxation of epitaxial SiGe layer and Ge diffusion during Ni silicidation on cap-Si/SiGe/Si(0 0 1)
Keywords: سیلیکید نیکل; 61.10.Nz; 68.55.Jk; Nickel silicide; Silicon-germanium; Silicidation; Strain relaxation;
Tuning nickel silicide properties using a lamp based RTA, a heat conduction based RTA or a furnace anneal
Keywords: سیلیکید نیکل; Nickel silicide; NiSi; RTA
Electrical properties of epitaxial NiSi2/Si contacts with extremely flat interface formed in Ni/Ti/Si(0 0 1) system
Keywords: سیلیکید نیکل; Nickel silicide; Epitaxial growth; Contact; Schottky barrier height; Silicon
Device processing and characterisation of high temperature silicon carbide Schottky diodes
Keywords: سیلیکید نیکل; 73.30.+y; 73.40.GkSchottky barrier diode; Nickel silicide; Silicon carbide; Avalanche breakdown
Investigation on the barrier height and inhomogeneity of nickel silicide Schottky
Keywords: سیلیکید نیکل; 73.30.+y; 73.40.Ns; 85.30.De; Nickel silicide; Schottky barrier inhomogeneities; I-V characteristic; Annealing;
Interface structure between epitaxial NiSi2 and Si
Keywords: سیلیکید نیکل; nickel silicide; interface; high resolution; image simulation; atomic structure;
Growth of size-tunable periodic Ni silicide nanodot arrays on silicon substrates
Keywords: سیلیکید نیکل; 81.05.Je; 42.82.Cr; 81.16.Dn; 61.46.Df; 68.55.Ac; 68.55.Jk; Nickel silicide; Nanosphere lithography; Self-assembly; Nanodots; Epitaxy; Thin films;
NiSi integration in a non-selective base SiGeC HBT process
Keywords: سیلیکید نیکل; 85.30.De; 85.30.Pq; SiGeC HBT; Nickel silicide;
Nickel-silicide process for ultra-thin-body SOI-MOSFETs
Keywords: سیلیکید نیکل; Nickel silicide; Salicide; Ultra-Thin-Body (UTB); SOI-MOSFET;