Growth, modulation and photoresponse characteristics of vertically aligned ZnO nanowires

Vertically aligned, c-axis oriented zinc oxide (ZnO) nanowires were grown on Si substrate by metal organic chemical vapor deposition (MOCVD) technique, where sputtered aluminum nitride (AlN) film was used as an intermediate layer and thermally evaporated barium fluoride (BaF2) film as a sacrificial layer. The aspect ratio and density of the nanowires were also varied using only Si microcavity without any interfacial or sacrificial layer. The UV detectors inside the microcavity have shown the higher on-off current ratio and fast photoresponse characteristics. The photoresponse characteristics were significantly varied with the aspect ratio and the density of nanowires.

Research highlights▶ Vertically aligned ZnO nanowires were grown on Si substrate by MOCVD. ▶ Aspect ratio and density of the nanowires were varied with an intermediate layer and the microcavity. ▶ Photoresponse characteristics were significantly varied with the aspect ratio and the density of NWs. ▶ UV detectors inside the microcavity have shown the higher on-off current ratio and fast photoresponse characteristics.