Fabrication of high-aspect-ratio (up to 10) one-dimensional organic/inorganic hybrid nanogratings via holographic lithography

• Ultrahigh-aspect-ratio nanogratings were fabricated by holographic lithography.
• The photoresist was epoxy-functionalized polyhedral oligomeric silsesquoxane.
• The pattern width ranged from 200 nm to 500 nm and pitch from 600 nm to 2 μm.
• The patterns showed high thermal and mechanical stability.
• The hybrid nanogratings could be converted to silica-like nanogratings.

We fabricated high-aspect-ratio (up to 10) one-dimensional (1D) nanogratings with width ranging from 200 nm to 500 nm and pitch from 600 nm to 2 μm via holographic lithography. An organic/inorganic hybrid material, epoxy-functionalized polyhedral oligomeric silsesquoxane (epoxy-POSS), was used as negative-tone photoresist due to its enhanced thermal and mechanical stability. The periodicity of 1D structure was controlled by the incident beam angle, while the filling fraction could be altered by exposure dosage. The undesired surface roughness could be reduced by increasing POSS crosslinking density. Furthermore, we showed that the epoxy-POSS nanogratings could be directly converted to silica-like nanogratings upon calcination.

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