کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
539297 1450379 2013 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Development of CO2 gas cluster cleaning method and its characterization
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Development of CO2 gas cluster cleaning method and its characterization
چکیده انگلیسی

As devices become smaller to the extent of nano-scale, dry damage-free cleaning process has become an important area of study. Gas cluster cleaning technology has a potential to remove contaminant particles from the surface of semiconductor wafers without damage because a gas cluster is smaller than 100 nm in diameter. In this paper, a new dry cleaning process using a CO2 gas cluster beam is developed and a characterization method for gas cluster generation was studied experimentally. First, a CO2 gas cluster cleaning system was built to evaluate the feasibility of cleaning by use of a gas cluster beam, which is generated by expansion of gas through a converging–diverging nozzle and nozzle chilling. Cleaning tests were performed several times. Twenty-five to three hundred nanometers silica particles were cleaned off from the surface of a bare Si wafer and of a wafer with 60 nm poly-silicon structure by using this cleaning system. Preliminary result showed that the contaminants were successfully removed without damage to the wafer surface. To characterize the gas cluster, we used the particle beam mass spectrometer (PBMS) for the measurement of the size distribution of the gas clusters. The size distribution of clusters is measured by varying flow rate and nozzle coolant temperature. From the measurement results, the size of a gas cluster was less than 40 nm, which is expected to cause no damage on a surface based on the measurement of pattern collapse force. By using the PBMS, CO2 gas cluster cleaning system can be optimized to provide the maximum cleaning efficiency for nano-scale contaminant particles without damage to substrate surfaces.

In this paper, the gas cluster cleaning method was investigated. The gas cluster cleaning method can be an alternative to commercial cleaning methods because the size of a gas cluster is below ∼100 nm. The characterization method for gas cluster generation is studied experimentally.Figure optionsDownload as PowerPoint slide

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 102, February 2013, Pages 87–90
نویسندگان
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