Subwavelength imaging of self-assembled triangular array through a silver superlens

• We explore subwavelength imaging of the isolated triangular nanostructures.
• We use a modified self-assembly method to fabricate triangular array mask.
• The superlens structure provides an enhanced imaging resolution.

Superlens nanolithography is a promising technique for patterning nanoscale structures because of its ability to overcome the diffraction limit. In this paper, subwavelength imaging of triangular particle array through a silver superlens is investigated. The superlens structure was optimized by means of the transfer transmission matrix method. The triangular array was obtained by self-assembly of nanoscale polystyrene spheres (PSS) and was successfully replicated into the photoresist. Experimental results show that the superlens structure provides at least 50 nm resolution, about 1/7 of the incidence wavelength.

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