Super resolution technique for sub-100 nm nanoimprint mold via mechanical deformation method

• We examined a super-resolution technique.
• We used the mechanical deformation without heating.
• The deformation characteristics were examined.
• The elastic area tended to become narrower as line width of the pattern was decreased.
• We fabricated a reduced-size replica mold with a line width of less than 100 nm.

A nanoscale patterning method that offers high throughput and cost-effective process has been strongly desired. Nanoimprint lithography (NIL) is a major breakthrough for next-generation lithography (NGL) due to its high resolution and simpler process. Since the resolution of NIL depends on the mold size, the fabrication method of a fine mold is a key factor for NIL. Therefore, we have developed a super resolution technique that uses mechanical deformation via a combination of an elastic UV-curable resin and a thermoplastic substrate. However, because we previously extended the plastic substrate by heating, it was difficult to achieve uniform shrinkage over a large area. In this study, we examined a super-resolution technique that uses a combination of an improved elastic UV-curable resin and an elastic substrate, so no damage occurred from heating. The deformation characteristics were examined by using a line-and-space pattern master mold. The results showed that the elastic area tended to become narrower as the line width of the pattern was decreased. As a result, we succeeded in fabricating a reduced-size replica mold with a line width of less than 100 nm.

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