A novel template-release method for low-defect nanoimprint lithography

• Defects rate of template releasing process in nanoimprint is investigated.
• Novel releasing method named push back method is proposed.
• The push buck method is good releasing property.
• The mechanism of the push back method is investigated.

Various template-releasing methods, including a newly proposed novel method for nanoimprint lithography, are examined and evaluated in terms of defect rates for line and pillar patterns. The newly proposed method, called the push-back method, shows excellent releasing performance. In the push-back method, a template is repeatedly pushed up and back to a resist pattern. We evaluated defect rates after template releasing for various methods using a newly developed tool controlled in multiple axes.

Figure optionsDownload as PowerPoint slide