کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
539587 | 871260 | 2011 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production.
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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 88, Issue 10, October 2011, Pages 3108–3112
Journal: Microelectronic Engineering - Volume 88, Issue 10, October 2011, Pages 3108–3112
نویسندگان
Fantao Meng, Gang Luo, Ivan Maximov, Lars Montelius, Jinkui Chu, Hongqi Xu,