Atomic and electronic structure of the (23×23)R30° strained Sn reconstruction on Ge/Si(1 1 1)

Motivated by the different behaviour of Sn/Si(1 1 1) and Sn/Ge(1 1 1) in their metal-insulator transition, we have explored the possibility of growing Sn on an ultra-thin Ge layer strained on top of a Si(1 1 1) substrate. We have demonstrated by scanning tunneling microscopy and low energy electron diffraction that a (23×23)R30° reconstruction can be stabilized under adequate growth conditions. The size of the reconstructed domains increases progressively up to a coverage of 1.3 monolayer of Sn, as determined by a combined study of scanning tunneling microscopy and core level spectroscopy. This coverage differs from that of Sn/Si(1 1 1) and Sn/Ge(1 1 1) exhibiting Mott phases. Angle resolved photoemission shows that the highly strained reconstruction is a band insulator, with a surface state dispersing roughly between 1300 and 2300 meV of binding energy.