کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5397221 | 1392324 | 2006 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Thickness dependence of X-ray absorption and photoemission in Fe thin films on Si(0â0â1) Thickness dependence of X-ray absorption and photoemission in Fe thin films on Si(0â0â1)](/preview/png/5397221.png)
To investigate the initial growth of Fe films on Si(0â0â1) and the Fe/Si interface, Fe films at various thicknesses have been systematically studied by soft X-ray absorption spectroscopy (XAS) and X-ray photoemission spectroscopy (XPS). The Fe L edge XAS spectrum shows a strong thickness dependence with broader line-width for thinner films. Detailed analysis of the Fe absorption signal as a function of the thickness shows that the broad linewidth of Fe L edge XAS spectra is mostly contributed by the first Fe layer at the Fe/Si interface. In contrast to XAS, Fe 2p photoemission spectra for these films are identical. However, valence band photoemission also shows a strong thickness dependence. Comparing the valence band photoemission spectra of the thin Fe/Si(0â0â1) films with that of pure Si and the thickest Fe film, the difference spectra at all thicknesses show almost identical shape indicating the same origin: the Fe/Si interface. Thus, it is mainly the first Fe layer at Fe/Si layer that is reactive with the Si substrate changing its electronic structure.
Journal: Journal of Electron Spectroscopy and Related Phenomena - Volume 151, Issue 3, May 2006, Pages 199-203