کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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539742 | 1450393 | 2010 | 4 صفحه PDF | دانلود رایگان |
This paper proposes two metal patterning processes. In each process, nanoimprint lithography (NIL) is used with commercialized particle-based silver nanoink which has appropriate properties for NIL. One process is a direct NIL process with a polydimethylsiloxane (PDMS) stamp; the other is a combined NIL and lift-off process. The direct NIL process is executed by using a xylene-absorbed PDMS stamp to decrease the curing time and minimize the residuals. A flexible PDMS stamp can also be wrapped around a quartz cylinder and used as a roll stamp to enlarge the patterned area. The direct NIL process successfully produced silver line patterns in the range of 200–300 nm, and the combined NIL and lift-off process successfully produced silver line patterns in the range of 15–60 nm.
Journal: Microelectronic Engineering - Volume 87, Issues 5–8, May–August 2010, Pages 839–842