Fabrication of a 3D stamp with the micro- and nano-scale patterns through combined NIL and optical lithography processes

Nanoimprint lithography is in the spotlight of the nano technology field for its ability to produce large area patterning [1], [2] and [4]. This kind of lithography is also able to fabricate three-dimensional functional structures all at once. In order to fabricate three-dimensional structures for an entire wafer, simple fabrication of three-dimensional large area stamp that combines micro- and nano-scale patterns is required. This paper proposes, the fabrication process of three-dimensional large area stamp that incorporates both micro- and nano-scale pattern. The three-dimensional stamp, which accounts for areas that range from 70nm to 3um, is fabricated on a Si substrate using nanoimprint lithography and optical lithography.