کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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539787 | 1450393 | 2010 | 5 صفحه PDF | دانلود رایگان |

There is growing demand for a fine metal-patterning technique to fabricate devices of the next generation, such as patterned media, plasmon photonics, and nanoscale electrodes. Nanotransfer printing (nTP) using a nanoscale patterned stamp has recently received considerable attention because of its high throughput and high resolution. To increase the throughput of the process further, it will be necessary to be able to use the stamp repeatedly, because fabrication of the stamp is a comparatively lengthy process. However, after the first transfer process, residual metal in the concave areas of the stamp obstructs the continuation of the transfer process. We examined a two-tone metal pattern transfer technique using a single mold after the first transfer process. The obstructive gold pattern in the mold could be removed and obtained as a negative tone by using a layer of polymer as a transfer substrate.
Journal: Microelectronic Engineering - Volume 87, Issues 5–8, May–August 2010, Pages 1019–1023