Effect of self purification on the structural optical and electrical properties of copper doped oxidized Zn films

The effect of self purification mechanism is studied on oxidized Cu-Zn thin films. Oxidized Cu-Zn thin films were prepared by thermal evaporation on glass substrates. XRD studies indicate that the oxidized Cu-Zn thin films are of hexagonal wurtzite structure. AFM images shows that with increase in copper wt. percent the nanoparticle morphology of oxidized Zn film turned to one dimensional nanorod morphology. XPS spectra of the oxidized Cu-Zn thin films shows the oxidized state of zinc and copper. The PL spectra of oxidized Zn film showed a strong and narrow near band edge emission at 380 nm whereas in the case of oxidized Cu-Zn thin films the emission showed peak near 410 nm corresponding to peak related to copper. With increase in copper content, the intensity of the defect emission decreased due to the self purification mechanism in nanomaterials. In addition the resistivity of doped films increased due to the self purification mechanism in nanomaterials.