Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material

An improved mold fabrication process that utilizes toluene diluted polydimethylsiloxane (PDMS) as flexible mold material was developed. Various toluene concentrations and their implication on the pattern definition using the Soft UV-Nanoimprint process were analyzed and discussed. Dots with a resolution of 50 nm are well replicated and an excellent imprint homogeneity across a 4 in. wafer with one imprint step only is demonstrated.